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WANG Peng, LI Qiang, GAO Zeng, CHENG Dongfeng, NIU Jitai. Investigation on magnetron sputtering Ti film and vacuum brazing of SiCp/Al composites with high volume fraction[J]. TRANSACTIONS OF THE CHINA WELDING INSTITUTION, 2015, 36(4): 43-46,82.
Citation: WANG Peng, LI Qiang, GAO Zeng, CHENG Dongfeng, NIU Jitai. Investigation on magnetron sputtering Ti film and vacuum brazing of SiCp/Al composites with high volume fraction[J]. TRANSACTIONS OF THE CHINA WELDING INSTITUTION, 2015, 36(4): 43-46,82.

Investigation on magnetron sputtering Ti film and vacuum brazing of SiCp/Al composites with high volume fraction

  • Ti film was magnetron-sputtered on SiCp/6063Al composite substrate containing 60% SiCp, and then the SiCp/6063Al composite was vacuum brazed with Al-Si-Mg foil as filler metal at 580℃ for 40 min. The interfacial microstructure and fracture appearance were investigated by SEM, EDS and XRD. The results show that the Ti film could improve the wettability of filler materials onto the composite materials. Transition layers existed not only between filler and Ti film, but also between the base metal and Ti film. A new phase TiC0.981 was found in the interfacial layer, and sound bonding occurred between the filler material and SiC particles.
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