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Chen Xueding, Akira Ohmori, Yoshiaki Arata. STUDY OF PHOTOCURRENT-POTENTIAL PROPERTY OF LOW PRESSURE CONDITION PLASMA SPRAYED TiO2 COATING ELECTRODE[J]. TRANSACTIONS OF THE CHINA WELDING INSTITUTION, 1990, (3): 129-135.
Citation: Chen Xueding, Akira Ohmori, Yoshiaki Arata. STUDY OF PHOTOCURRENT-POTENTIAL PROPERTY OF LOW PRESSURE CONDITION PLASMA SPRAYED TiO2 COATING ELECTRODE[J]. TRANSACTIONS OF THE CHINA WELDING INSTITUTION, 1990, (3): 129-135.

STUDY OF PHOTOCURRENT-POTENTIAL PROPERTY OF LOW PRESSURE CONDITION PLASMA SPRAYED TiO2 COATING ELECTRODE

  • In this paper,the TiO2 coating electrode having a good photocurrent-potentail property has been discovered by varying the quantity of auxiliary gas (H2),the pressure of spraying chamber and the heat treatment temperature of the coating,etc.,in spraying TiO2 coating with low pressure condition plasma.By analysing the structure of the coating,it has been showed that the photocurrent-potential property of TiO2 coating depends on the structure of the coating.When there are appropriate Ti3O5 and Magnel phase in rutile TiO2 coating,rutile TiO2 coating will show an optimum photocurrent-potential property directly proportional to light intensity.If the coating consists of rutile TiO2 or Ti_2O_3,Ti3O5 and Magnelis phase,its photocurrent-potential property will disappear.
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