Abstract: Magnetron sputtering ion plating has been used to make aluminium coating on beryllium substrate.Effect of ions bombardment on morphology,crystallographic orientation and interface layer were studed.The results show that during initial stages of plating,energetic ions bombardment and circle bombardment plating can increase the width of interface layer consisting of Be and Al atom. Al coating grows largely in (111) crystallographic orientation and the grain size is much larger when ions bombardment is none; Al coating begins to grow in crystallographic randomness and the grain size decreases with ions energy increasing,if ions energy is up to a certain value Al coating grows again largely in (111) crystallographic orientation and grain size increases again with ions energy increasing.