氮气氛下电火花沉积TiN层的形成机理及微观特征
Forming mechanism and microtructural characteristics of TiN coatings prepared by electrospark deposition under nitrogen atmosphere
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摘要: 以工业纯钛TA2为电极,用N2作为反应及保护气体,采用电火花沉积方法,在45钢基体表面制备出了含TiN的硬质沉积层。采用金相显微镜、扫描电镜和X射线衍射等分析检测方法,对沉积层形成机理、微观结构及界面行为进行研究,并测试了沉积层的显微硬度分布。结果表明,电火花氮化沉积层与基体形成良好的冶金结合,沉积层主要由TiN相组成,组织致密、均匀、较连续,厚度为30~40μm,显微硬度最高达1515 HV,是基体硬度的5倍以上,可以有效地改善基体的表面性能。Abstract: The electrospark deposition technique was applied to deposit hard TiN coatings on 45 steel substrates with TA2 electrode and nitrogen gas as the reacting and shielding atmosphere.The forming mechanism, microstructures and interfacial behavior of the nitrided coatings were investigated by optical microscope, scanning electronic microscope and X-ray diffraction.And the microhardness profile of nitrided coating was measured as well.The results show that a good metallurgical bonding between the coating and the substrate is obtained.The nitrided deposition coatings are mainly composed of TiN and α-Fe phases.They are fully dense, uniform and comparatively continuous with 30 -40 μm thickness.The highest microhardness of the coating reaches to 1 515 HV which is five times more than that of the substrates.The surface performance of the substrate may be effectively improved.