Electrode wobble technology of electro-spark deposition based on orthogonal tests
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摘要:
为了探索电火花自动沉积工艺，设计并进行了电极摆动正交试验和多道多层连续沉积试验，分析电极摆动工艺参数对单道沉积层成形的影响和电极摆动对多道多层连续沉积的沉积效率、材料转移效率的影响. 结果表明，电极纵向运动时，通过电极摆动可提高电极和工件的接触面积，使沉积点均匀分布，提高电火花沉积的沉积效率和材料转移效率. 电极摆动进行单道沉积时，电极摆动幅值、摆动间距和运动速度影响了单道沉积层的表面形貌、平均宽度、平均波动值、沉积效率和材料转移效率；影响沉积效率和材料转移效率的主次因素为运动速度、摆动间距和摆动幅值，影响平均宽度的主次因素为摆动幅值、运动速度和摆动间距，影响平均波动值的主次因素为摆动间距、运动速度和摆动幅值.
Abstract:To investigate the electro-spark deposition process, orthogonal tests with electrode wobble and multi-pass multilayer continuous deposition experiments were designed and conducted, analyzing the influence of electrode wobble parameters on single-pass deposition layer formation and the effects of electrode wobble on deposition efficiency and material transfer efficiency in multi-pass multilayer continuous deposition. The results show that during longitudinal electrode movement, electrode wobble can increase the contact area between the electrode and workpiece, achieve uniform distribution of deposition points, and enhance both deposition efficiency and material transfer efficiency in electro-spark deposition. In single-pass deposition with electrode wobble, the wobble amplitude, wobble spacing, and movement speed significantly affect the surface morphology, average width, average fluctuation value, deposition efficiency, and material transfer efficiency of the single-pass deposition layer. The dominant factors influencing deposition efficiency and material transfer efficiency in descending order are movement speed, wobble spacing, and wobble amplitude. The main factors affecting average width are wobble amplitude, movement speed, and wobble spacing, while those influencing average fluctuation value are wobble spacing, movement speed, and wobble amplitude.
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图 1 单道沉积时旋转电极与工件的相对运动方式
Figure 1. Relative motion mode of the rotating electrode and the workpiece during single-pass deposition. (a) longitudinal movement of electrodes; (b) Lateral movement of electrodes; (c) electrode swing longitudinal motion
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图 2 多道多层连续沉积时电极与工件的相对运动轨迹(mm)
Figure 2. Relative motion trajectories of electrode and workpiece during multi-pass multi-layer continuous deposition. (a) electrode oscillates; (b) electrode is not oscillating
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图 3 单道沉积层的宽度和波动值的测量原理
Figure 3. Measurement principle of width and fluctuation value of single pass deposited layer
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图 4 不同因素和水平下单道沉积层的表面形貌
Figure 4. Surface morphology of the deposited layer under different factors and levels. (a) test 1; (b) test 2; (c) test 3; (d) test 4; (e) test 5; (f) test 6; (g) test 7; (h) test 8; (i) test 9
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图 5 单道沉积层的电极摆动搭接成形原理图
Figure 5. Lap forming principle diagram of single pass deposited layer with electrode wobble. (a) wc = b; (b) wc＞b (d is positive); (c) wc＜b (d is negative)
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图 6 电极摆动和电极不摆动沉积层的表面形貌和截面形貌
Figure 6. Surface morphology and cross section morphology of deposited layer with electrode wobble and electrode non-wobble. (a) wobble; (b) non-wobble
表 1 正交试验因素水平表
Table 1 Factors and levels table of orthogonal tests
编号因素A 因素B 因素C 摆动幅值
a/mm摆动间距
b/mm运动速度
v/(mm·s−1)1 2 2.5 1 2 1 2 3 3 2 1.5 3 4 1 2.5 2 5 1.5 2.5 3 6 2 2 2 7 1.5 2 1 8 1.5 1.5 2 9 1 1.5 1 
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表 2 正交试验结果
Table 2 Results of orthogonal tests
编号 试验因素 评价指标 摆动幅值
a/mm摆动间距
b/mm运动速度
v/(mm·s−1)沉积效率
η/(mg·s−1)材料转移效率
K(%)平均宽度
wsa/mm平均波动值
Δa/(mm2)1 2 2.5 1 0.047778 47.87755 2.877214 0.014342553 2 1 2 3 0.064667 63.28571 1.861458 0.010683787 3 2 1.5 3 0.067444 65.38926 2.804077 0.007549996 4 1 2.5 2 0.067953 68.57143 1.808436 0.016493864 5 1.5 2.5 3 0.044722 39.39098 2.305103 0.020013310 6 2 2 2 0.068639 69.60526 2.839291 0.008260286 7 1.5 2 1 0.057072 61.29032 2.413347 0.008949453 8 1.5 1.5 2 0.082525 73.50427 2.348250 0.005021784 9 1 1.5 1 0.054630 57.55556 1.993357 0.004855860
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表 3 正交试验极差分析结果
Table 3 Results of the orthogonal test with extreme difference analysis
评价指标 因素 S1j S2j S3j Rj 优水平 主次关系 η A 0.062 0.061 0.061 0.001 A1 C>B>A B 0.068 0.063 0.053 0.015 B1 C 0.053 0.073 0.059 0.020 C2 K A 63.138 58.062 60.957 5.076 A1 C>B>A B 65.483 64.727 51.947 13.536 B1 C 55.574 70.56 56.022 14.986 C2 wsa A 1.888 2.356 2.840 0.952 A3 A>C>B B 2.382 2.371 2.330 0.052 B1 C 2.428 2.332 2.324 0.104 C1 Δa A 0.011 0.011 0.010 0.001 A3 B>C>A B 0.006 0.009 0.017 0.011 B1 C 0.009 0.010 0.013 0.003 C1
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表 4 多道多层连续沉积试验的沉积效率和材料转移效率
Table 4 Deposition efficiency and material transfer efficiency of multi-pass multi-layer continuous deposition tests
试验类型 沉积效率
η/(mg·s−1)材料转移效率
K(%)电极摆动 0.030 7 59.37 电极不摆动 0.025 1 46.44
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表 5 放电波形类型和比例统计表
Table 5 Statistical table of discharge waveform types and proportions
试验类型 短路放电比例P1(%) 间隙放电比例P2(%) 接触放电比例P3(%) 空载放电比例P4(%) 合计放电数量N/个 电极摆动 25.9 5.5 53.8 14.8 236 电极不摆动 36.4 7.6 39.0 17.0 236
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